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Xiaohang Li

Assistant Professor, Electrical Engineering

Computer, Electrical and Mathematical Science and Engineering Division


Advanced Semiconductor Laboratory

Affiliations

Education Profile

  • ​​​​​Ph.D., Electrical Engineering (minor in Physics), Georgia Institute of Technology 2015
  • M.S., Electrical Engineering, Lehigh University 2011
  • B.S., Applied Physics, Huazhong University of Science and Technology, 2008

Research Interests

Professor Li is interested in the investigation of growth, simulation, fabrication, and characterization of III-nitride structures for next-generation devices.

The devices of particular interest include LED, laser, solar cells, transistors, and sensors. Because of excellent properties of III-nitrides, these devices are expected to become the enabling technologies to revolutionize energy, communication, biochemical, biomedical, and data storage industries and many others.

Professor Li’s research activities are highly interdisciplinary. They involve electrical engineering, applied physics, material science, chemical engineering and other related disciplines.

Selected Publications

  • H. Sun, Y. Park, K.-H. Li, C. G. T. Castanedo, A. S. Alowayed, T. Detchprohm, R. D. Dupuis, and X. Li, “Band alignment of B0.14Al0.86N / Al0.7Ga0.3N heterojunction,” Appl. Phys. Lett. 111, 13 (2017)
  • N. Alfaraj, S. Mitra, F. Wu, I. Ajia, B. Janjua, A. Prabaswara, R. A. Aljefri, H. Sun, T. K. Ng, B. S. Ooi, I. S. Roqan, and X. Li, “Photoinduced entropy of InGaN/GaN p-i-n double-heterostructure nanowires,” Appl. Phys. Lett. 110, 161110 (2017).
  • M. Zhang and X. Li, “Structural and Electronic Properties of Wurtzite BxAl1-xN from First-Principles Calculations”, Phys. Status Solidi B, 254 (8), 1600749 (2017).
  • H. Sun, F. Wu, Y. J. Park, T. M. Al tahtamouni, K.-H. Li, N. Alfaraj, T. Detchprohm, R. D. Dupuis, and X. Li, “Influence of TMAl preflow on AlN epitaxy on sapphire,” Appl. Phys. Lett. 110, 192106 (2017).
  • F. Wu, H. Sun, I. A. Ajia, I. S. Roqan, D. Zhang, J. Dai, C. Chen, Z. C. Feng, and X. Li, “Significant internal quantum efficiency enhancement of GaN/AlGaN multiple quantum wells emitting at ~350 nm via step quantum well structure design,” J. Phys. D: Appl. Phys., 50, 245101 (2017).